MicroLink Devices’ core manufacturing technology strength is metal-organic chemical vapor deposition (MOCVD) of III-V semiconductor materials. In MOCVD, semiconductor epitaxial structures are formed by the chemical reaction of gaseous compounds on the surface of a semiconductor wafer. By careful calibration of the chemical reactions, the thickness of the epitaxial layers can be controlled to a tolerance of less than 1 nm and the composition and doping of the layers can be determined.

With a combined total of several decades of experience, and dozens of papers in peer-reviewed technical journals, MicroLink staff members are internationally acknowledged experts on MOCVD technology.


Recent News
Read more on what's happening at MicroLink...